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dc.contributor.author주상우ko
dc.contributor.author바너지나라얀ko
dc.contributor.author민봉기ko
dc.date.accessioned2015-12-17T03:56:31Z-
dc.date.available2015-12-17T03:56:31Z-
dc.date.created2015-11-13-
dc.date.issued201410-
dc.identifier.citationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.14, no.10, pp.7970 - 7975-
dc.identifier.issn1533-4880-
dc.identifier.urihttp://hdl.handle.net/YU.REPOSITORY/30663-
dc.identifier.urihttp://dx.doi.org/10.1166/jnn.2014.9399-
dc.description.abstractA low temperature sputter deposition process is adopted to fabricate nanocrystalline ZnO thin films on plastic (polyethylene terepthalate) substrate. Very good crystalline films are synthesized at a substrate temperature around 120 degrees C. Structural and microstructural analyses confirm the proper phase formation of the nanomaterial with an average nanoparticle size around 5-10 nm. Optical transmission analysis of the film deposited on plastic substrate depicts nearly 90% visible transmittance with a direct bandgap around 3.56 eV. This cost-effective, low-temperature fabrication of nanocrystalline thin film with very good structural and optical properties will find important applications in plastic display technology. Also the process is a vacuum-based clean process, which is compatible to CMOS-IC fabrication techniques and therefore, can easily be integrated with modern solid state device fabrication processes for diverse device applications.-
dc.language영어-
dc.publisherAMER SCIENTIFIC PUBLISHERS-
dc.subjectORGANIC SOLAR-CELLS-
dc.subjectGROWTH-
dc.subjectELECTRONICS-
dc.subjectFABRICATION-
dc.subjectNANOWIRES-
dc.subjectEFFICIENT-
dc.subjectNANORODS-
dc.subjectEPITAXY-
dc.subjectARRAYS-
dc.subjectOXIDE-
dc.titleNanocrystalline ZnO Thin Film Deposition on Flexible Substrate by Low-Temperature Sputtering Process for Plastic Displays-
dc.typeArticle-
dc.identifier.wosid000336494500110-
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공과대학 > 기계공학부 > Articles
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