Electrical and optical characteristics of Ar plasma generated by low-frequency (60Hz) power source

Title
Electrical and optical characteristics of Ar plasma generated by low-frequency (60Hz) power source
Author(s)
박진호김홍탁김창득표명식
Keywords
DEPOSITION; CARBON
Issue Date
201410
Publisher
KOREAN INSTITUTE CHEMICAL ENGINEERS
Citation
KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.31, no.10, pp.1892 - 1897
Abstract
The optical and electrical properties of Ar plasma, ignited using low-frequency (LF, 60 Hz) power source, were investigated. The plasma resistance, electron temperature, and density were found to be similar to 10(2) Omega, similar to 3 eV and similar to 10(8) cm(-3), respectively. The plasma parameters are strongly dependent on Ar pressure and discharge current, and the results of optical emission analysis showed similar tendency to the probe measurements. The properties of Ar plasma are similar to DC-pulsed discharge, and the polarity of AC power can be possible of depositions and modifications on both conductive and insulating materials, unlike DC discharge. The a-C films, which are deposited using Ar-diluted CH4 plasma, showed a smooth surface, high transmittance (> 80%), high sp(3) concentration (similar to 40%) and wide optical band-gap (3.55 eV). Consequently, the LF power source was found to be a very simple, convenient and inexpensive tool to generate plasmas for various applications.
URI
http://hdl.handle.net/YU.REPOSITORY/30651http://dx.doi.org/10.1007/s11814-014-0145-9
ISSN
0256-1115
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공과대학 > 화학공학부 > Articles
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