Development of uniform density control with self-assembled colloidal gold nanoparticles on a modified silicon substrate

Title
Development of uniform density control with self-assembled colloidal gold nanoparticles on a modified silicon substrate
Author(s)
심재진강찬규[강찬규]Ashurst R. W.[Ashurst R. W.]허윤석[허윤석]노창현[노창현]
Keywords
MICROELECTROMECHANICAL SYSTEMS; TRIBOLOGICAL PROPERTIES; CU NANOPARTICLES; SURFACE; ANTIWEAR; OIL; FUNCTIONALIZATION; MANIPULATION; PERFORMANCE; MONOLAYERS
Issue Date
201410
Publisher
SPRINGER
Citation
BIOPROCESS AND BIOSYSTEMS ENGINEERING, v.37, no.10, pp.1997 - 2004
Abstract
Here, we present a simple method for controlling the density of Au nanoparticles (Au NPs) on a modified silicon substrate, by destabilizing the colloidal Au NPs with 3-mercaptopropyltrimethoxylsilane (3-MPTMS) for microelectromechanical-system-based applications to reduce tribological issues. A silicon surface was pretreated with a 3-MPTMS solution, immediately after which thiolated Au NPs were added to it, resulting in their uniform deposition on the silicon substrate. Without any material property change of the colloidal Au NPs, we observed the formation of large clusters Au NPs on the modified silicon surface. Analysis by scanning electron microscopy with energy dispersive X-ray spectroscopy indicated that the addition of 3-MPTMS resulted in an alternation of the chemical characteristics of the solution. Atomic force microscopy imaging supported the notion that silicon surface modification is the most important factor on tribological properties of materials along with ligand-modified Au NPs. The density of Au NPs on a silicon surface was significantly dependent on several factors, including the concentration of colloidal Au NPs, deposition time, and concentration of 3-MPTMS solution, while temperature range which was used throughout experiment was determined to have no significant effect. A relatively high density of Au NPs forms on the silicon surface as the concentrations of Au NPs and 3-MPTMS are increased. In addition, the maximum deposition of Au NPs on silicon wafer was observed at 3 h, while the effects of temperature variation were minimal.
URI
http://hdl.handle.net/YU.REPOSITORY/30601http://dx.doi.org/10.1007/s00449-014-1175-8
ISSN
1615-7591
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공과대학 > 화학공학부 > Articles
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