Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization

Title
Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization
Author(s)
김수현여승민박지윤최상혁천태훈[천태훈]임병용[임병용]김선정[김선정]
Keywords
OXYGEN; ELECTRODEPOSITION; PRECURSOR; CU
Issue Date
201311
Publisher
ELSEVIER SCIENCE SA
Citation
THIN SOLID FILMS, v.546, pp.2 - 8
Abstract
Ruthenium (Ru) thin films were grown on thermally-grown SiO2 substrates using atomic layer deposition (ALD) by a sequential supply of (ethylbenzene)(1,3-cyclohexadiene)Ru(0) (EBCHDRu, C14H18Ru), and molecular oxygen (O-2) at deposition temperatures ranging from 140 to 350 degrees C. A self-limiting film growth was confirmed at the deposition temperature of 225 degrees C and the growth rate was 0.1 nm/cycle on the SiO2 substrate with a negligible number of incubation cycles (approximately 2 cycles). Plan-view transmission electron microscopy analysis showed that nucleation was started after only 3 ALD cycles and the maximum nuclei density of 1.43 x 10(12)/cm(2) was obtained after 5 ALD cycles. A continuous Ru film with a thickness of similar to 4 nm was formed after 40 ALD cycles. The film resistivity was decreased with increasing deposition temperature, which was closely related to its crystallinity, microstructure, and density, and the minimum resistivity of similar to 14 mu Omega-cm was obtained at the deposition temperature of 310 degrees C. The step coverage was approximately 100% at trench (aspect ratio: 4.5) with the top opening size of similar to 25 nm. Finally, the ALD-Ru film was evaluated in terms of its performance as a seed layer for Cu electroplating. (c) 2013 Elsevier B.V. All rights reserved.
URI
http://hdl.handle.net/YU.REPOSITORY/28609http://dx.doi.org/10.1016/j.tsf.2013.03.074
ISSN
0040-6090
Appears in Collections:
공과대학 > 신소재공학부 > Articles
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE