Effects of nitrogen flow rate on titanium nitride films deposition by DC facing target sputtering method

Title
Effects of nitrogen flow rate on titanium nitride films deposition by DC facing target sputtering method
Author(s)
박진호김홍탁박준영[박준영]
Keywords
THIN-FILMS; MECHANICAL-PROPERTIES; COATINGS
Issue Date
201205
Publisher
KOREAN INSTITUTE CHEMICAL ENGINEERS
Citation
KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.29, no.5, pp.676 - 679
Abstract
TiN films were deposited onto a glass substrate by DC facing target sputtering, and the effects of N-2 flow rate on the film properties were investigated. Prepared TIN films had a rock salt (NaCl-type) structure with a very low resistivity (similar to 30 mu Omega.cm) and gold-like color. Increase in the N-2 flow rate played an important role in controlling the properties of TIN films, such as Ti/N ratio and growth orientation. The growth orientation changed from a (111) phase to (200), with the ratio of N/Ti becoming near stoichiometric. The change in the growth orientation was caused by the increase in the N-2 flow rate, which weakens the kinetic energy of the bombarding particles. The observed phenomenon is explained by an energy loss in the reactive plasma due to the difference in the inner degree of freedom of the molecular gas causing the reduction in the effective energy for radicals.
URI
http://hdl.handle.net/YU.REPOSITORY/28398http://dx.doi.org/10.1007/s11814-011-0219-x
ISSN
0256-1115
Appears in Collections:
공과대학 > 화학공학부 > Articles
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