Effect of Rod Diameters on Flow Pattern and Temperature Profile in Monosilane Siemens Poly-Si Reactor
- Effect of Rod Diameters on Flow Pattern and Temperature Profile in Monosilane Siemens Poly-Si Reactor
- 전소영; 정호섭; 박종훈[박종훈]; 김우경
- Issue Date
- TAYLOR & FRANCIS LTD
- MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.585, no.1, pp.73 - 81
- The deposition rate of polysilicon and the temperature and concentration profiles of the reactant gases in a monosilane Siemens reactor were compared for rod diameters of 10-120mm using the computational fluid dynamics method. It was found that the power consumption primarily depends on the Si rod diameter and the Si deposition rate. The relationship between the power consumption and the Si deposition rate at different Si rod diameters was established from the accumulated experimental data of a pilot-scale four-rod reactor, and it is incorporated into the MonoSim-S software package.
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