Effect of Rod Diameters on Flow Pattern and Temperature Profile in Monosilane Siemens Poly-Si Reactor

Title
Effect of Rod Diameters on Flow Pattern and Temperature Profile in Monosilane Siemens Poly-Si Reactor
Author(s)
전소영정호섭박종훈[박종훈]김우경
Issue Date
201312
Publisher
TAYLOR & FRANCIS LTD
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.585, no.1, pp.73 - 81
Abstract
The deposition rate of polysilicon and the temperature and concentration profiles of the reactant gases in a monosilane Siemens reactor were compared for rod diameters of 10-120mm using the computational fluid dynamics method. It was found that the power consumption primarily depends on the Si rod diameter and the Si deposition rate. The relationship between the power consumption and the Si deposition rate at different Si rod diameters was established from the accumulated experimental data of a pilot-scale four-rod reactor, and it is incorporated into the MonoSim-S software package.
URI
http://hdl.handle.net/YU.REPOSITORY/28103http://dx.doi.org/10.1080/15421406.2013.849519
ISSN
1542-1406
Appears in Collections:
중앙도서관 > rims journal
공과대학 > 화학공학부 > Articles
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