Controlling spatial density and size of nanocrystals by two-step atomic layer deposition

Title
Controlling spatial density and size of nanocrystals by two-step atomic layer deposition
Author(s)
김수현이도중[이도중]임성수[임성수]김기수[김기수]김기범[김기범]
Keywords
PLATINUM NANOPARTICLES; CARBON-MONOXIDE; FUEL-CELLS; PART I; MEMORY; SINGLE; GROWTH; NANOTUBES; OXIDATION; DEVICES
Issue Date
201101
Publisher
IOP PUBLISHING LTD
Citation
NANOTECHNOLOGY, v.22, no.9
Abstract
Two-step atomic layer deposition (ALD) is proposed in order to control both the spatial density and size of nanocrystals (NCs) via modulation of the nucleation rate during deposition. In this process, two different deposition conditions are sequentially used: a high nucleation rate condition for the formation of high density NCs and a low nucleation rate condition with a slow growth rate for the subsequent growth of pre-formed NCs. To control the nucleation rate of Ru during ALD, pulsing time and carrier flow rate of the Ru precursor are varied. By controlling those factors, both the film growth rate and a nucleation rate of Ru are decreased considerably. Two-step ALD of Ru NCs using the surface-saturated condition followed by the reduced condition allows for variation of the spatial density from 7.9 x 10(11) to 3.2 x 10(12) cm(-2) and variation of the average diameter from 1.9 to 3.3 nm.
URI
http://hdl.handle.net/YU.REPOSITORY/25743http://dx.doi.org/10.1088/0957-4484/22/9/095305
ISSN
0957-4484
Appears in Collections:
공과대학 > 신소재공학부 > Articles
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