One-step maskless grayscale lithography for the fabrication of 3-dimensional structures in SU-8

Title
One-step maskless grayscale lithography for the fabrication of 3-dimensional structures in SU-8
Author(s)
아슈샬마Amritha Rammohana[Amritha Rammohana]Prabhat K. Dwivedia[Prabhat K. Dwivedia]Rodrigo Martinez-Dua[Rodrigo Martinez-Dua]Hari Katepalli[Hari Katepalli]Marc J. Madou[Marc J. Madou]
Keywords
ELECTRON-BEAM LITHOGRAPHY; HIGH-SENSITIVITY; RESIST; MICROSTRUCTURES; UV
Issue Date
201103
Publisher
ELSEVIER SCIENCE SA
Citation
SENSORS AND ACTUATORS B-CHEMICAL, v.153, no.1, pp.125 - 134
Abstract
We propose a novel and simplified method to fabricate complex 3-dimensional structures in SU-8 photoresist using maskless grayscale lithography. The proposed method uses a Digital Micro-mirror Device (DMD (R)) to modulate the light intensity across a single SU-8 photoresist layer. Top and back-side exposure are implemented in the fabrication of original structures such as cantilevers, covered channels with embedded features and arrays of microneedles. The fabrication of similar structures in SU-8 with other techniques often requires complex physical masks or the patterning of several stacked layers. The effects of critical process parameters such as software mask design, exposure and developing conditions on the quality of 3-D structures are discussed. A number of applications using bridges, cantilevers and micromixers fabricated using this methodology are explored. (C) 2010 Elsevier B.V. All rights reserved.
URI
http://hdl.handle.net/YU.REPOSITORY/25555http://dx.doi.org/10.1016/j.snb.2010.10.021
ISSN
0925-4005
Appears in Collections:
공과대학 > 기계공학부 > Articles
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