Development of a Two-Chamber Process for Self-Assembling a Fluorooctatrichlorosilane Monolayer for the Nanoimprinting of Full-Track Nanopatterns with a 35 nm Half Pitch

Title
Development of a Two-Chamber Process for Self-Assembling a Fluorooctatrichlorosilane Monolayer for the Nanoimprinting of Full-Track Nanopatterns with a 35 nm Half Pitch
Author(s)
임지석최성우[최성우]한정진[한정진]김중억[김중억]김호관[김호관]김석민[김석민]강신일[강신일]
Keywords
FABRICATION; LITHOGRAPHY; STAMP; REPLICATION; MEMS
Issue Date
201107
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.11, no.7, pp.5921 - 5927
Abstract
The technology of depositing a uniform and stable anti-adhesion layer on a wafer-scale nanostamp is a critical issue in the industrialized nanoimprinting process. The deposition of an anti-adhesion layer involves O(2) plasma treatment to modify the stamp surface and the reaction of the monomers with the surface. Although an automated one-chamber system was developed for uniform and stable anti-adhesion layer coating, unwanted molecules are irregularly deposited on a sample during the O(2) plasma treatment due to the contamination of the chamber, leading to the degradation of the anti-adhesion properties. In this paper, a two-chamber self-assembled monolayer (SAM) deposition system was proposed to prevent the degradation of the anti-adhesion properties due to contamination. To examine the effectiveness of the proposed system, the contact angles and chemical compositions of the SAM-coated silicon mold prepared using the one- and two-chamber systems were measured and compared. Finally, 4-in nanoimprinting of 35-nm-half-pitch full-track nanopatterns was conducted using a SAM-coated silicon nanomold prepared using the one- and two-chamber systems, and the replication quality was examined.
URI
http://hdl.handle.net/YU.REPOSITORY/24911http://dx.doi.org/10.1166/jnn.2011.4368
ISSN
1533-4880
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공과대학 > 기계공학부 > Articles
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