Deposition of p-Type Transparent CuxS Thin Films Using a Continuous Flow Microreactor

Title
Deposition of p-Type Transparent CuxS Thin Films Using a Continuous Flow Microreactor
Author(s)
류시옥이진영정지영류상욱[류상욱]이태진
Keywords
GROWTH
Issue Date
201108
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, v.6, no.3, pp.334 - 337
Abstract
A novel solution-based deposition method has been developed to synthesize both binary and ternary chalcogenide thin films. It employs a continuous flow microreactor, which is capable of decoupling homogeneous particle formation from heterogeneous thin film growth and is able to overcome the disadvantages of conventional chemical bath deposition process. In this study, CuxS thin film was deposited on substrate using the continuous flow microreactor with an alkaline medium. The film was then characterized by X-ray diffraction, scanning electron microscope, and transmission electron microscopy. The film's optical properties were also measured by UV-vis spectroscopy. Average grain size of CuxS thin film was around 60-100 nm with uniform size distribution. Its optical band gap was estimated to be around 2.7 eV. Based on the X-ray diffraction, the deposited film was identified as the chalcocite phase Cu2S. Chemical binding information of the CuxS thin film was studied by X-ray photoelectron spectroscopy.
URI
http://hdl.handle.net/YU.REPOSITORY/24818http://dx.doi.org/10.1166/jno.2011.1180
ISSN
1555-130X
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공과대학 > 화학공학부 > Articles
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