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Showing results 1 to 3 of 3

Issue DateTitleAuthor(s)
2012-07Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant김수현; 문기영; 최상경; 박지윤; 천태훈[천태훈]; 김우경; 임병용[임병용]; 김선정[김선정]; 홍태은[홍태은]
2013-11Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization김수현; 여승민; 박지윤; 최상혁; 천태훈[천태훈]; 임병용[임병용]; 김선정[김선정]
2014-07The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect김수현; 문기영; 홍태은[홍태은]; 천태훈; 장유진; 임병용[임병용]; 김선정[김선정]

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